Advances in resist materials and processing technology XXVI (23-25 February 2009, San Jose, California, United States)Henderson, Clifford L.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 2 vol, 2, isbn 978-0-8194-7526-8 0-8194-7526-2Conference Proceedings

Advances in resist materials and processing technology XXV (25-27 February 2008, San Jose, California, USA)Henderson, Clifford L.Proceedings of SPIE, the International Society for Optical Engineering. 2008, issn 0277-786X, isbn 978-0-8194-7108-6, 2 v, isbn 978-0-8194-7108-6Conference Proceedings

Study of the simulation parameter for EUVLSEKIGUCHI, Atushi.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72731G.1-72731G.11, 2Conference Paper

Pressure control for reduced microbubble formationBRAGGIN, Jennifer.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72730U.1-72730U.9, 2Conference Paper

Stochastic Modeling in Lithography: The Use of Dynamical Scaling in Photoresist DevelopmentMACK, Chris A.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72732I.1-72732I.15, 2Conference Paper

Double Patterning Study with Inverse LithographyKIM, Sang-Kon.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692323.1-692323.6, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Rise of chemical amplification resists from laboratory curiosity to paradigm enabling Moore's lawITO, Hiroshi.Proceedings of SPIE, the International Society for Optical Engineering. 2008, issn 0277-786X, isbn 978-0-8194-7108-6, Part I, 692302.1-692302.15Conference Paper

Theoretical analysis of energy degradation of electron in the resistsTORIUMI, Minoru.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72732X.1-72732X.6, 2Conference Paper

Stochastic Modeling in Lithography: Autocorrelation Behavior of Catalytic Reaction-Diffusion SystemsMACK, Chris A.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72732G.1-72732G.6, 2Conference Paper

Characteristic three-dimensional structure of resist's distribution after drying a resist solution coated on a flat substrate: analysis using the extended dynamical model of the drying processKAGAMI, Hiroyuki.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 727335.1-727335.8, 2Conference Paper

Molecular resists based on calix[4]resorcinarene derivatives for EB lithographyOKUYAMA, Kenichi.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 7273U.1-72732U.7, 2Conference Paper

Theoretical analysis of development behavior of resist measured by QCMTORIUMI, Minoru.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72732Y.1-72732Y.6, 2Conference Paper

Elucidating the Physiochemical and Lithographic Behavior of Ultra-Thin Photoresist FilmsSUNDARAMOORTHI, Annapoorani; YOUNKIN, Todd R; HENDERSON, Clifford L et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72733V.1-72733V.10, 2Conference Paper

Mesoscale Kinetic Monte Carlo Simulations of Molecular Resists: The Effect on PAG Homogeneity on Resolution, LER, and SensitivityLAWSON, Richard A; HENDERSON, Clifford L.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 727341.1-727341.10, 2Conference Paper

Single Component Molecular Resists Containing Bound Photoacid Generator FunctionalityLAWSON, Richard A; TOLBERT, Laren M; HENDERSON, Clifford L et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72733C.1-72733C.9, 2Conference Paper

Meso-scale simulation of the polymer dynamics in the formation process of line-edge roughnessMORITA, Hiroshi; DOI, Masao.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 727337.1-727337.8, 2Conference Paper

Development of New Phenylcalix[4]resorcinarene: Its Application to Positive-Tone Molecular Resist for EB and EUV LithographyECHIGO, Masatoshi; OGURO, Dai.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72732Q.1-72732Q.12, 2Conference Paper

Study of De-protection reaction Analysis System for EUV LithographySEKIGUCHI, A; KONO, Y.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69232C.1-69232C.14, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

60 Seconds Puddle time-a tradition to overcome in CA resists : Process optimization and defect eliminationSHALOM, Eitan; ZEID, Shaike.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69233W.1-69233W.10, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Characterization of Resist and Topcoat Properties for Immersion LithographyJAIN, Kaveri; HISHIRO, Yoshi.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692320.1-692320.10, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

A comprehensive resist model for the prediction of line-edge roughness material and process dependencies in optical lithographySCHNATTINGER, Thomas; ERDMANN, Andreas.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69230R.1-69230R.12, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Plasma etch properties of organic BARCsRUNHUI HUANG; WEIGAND, Michael.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69232G.1-69232G.9, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Quantitative characterization of the optical properties of absorbing polymer films: Comparative investigation of the internal reflection intensity analysis methodTAO LIU; HENDERSON, Clifford L; SAMUELS, Robert et al.Journal of polymer science. Part B. Polymer physics. 2003, Vol 41, Num 8, pp 842-855, issn 0887-6266, 14 p.Article

Sarcoidal alopecia as a mimic of discoid lupus erythematosusHENDERSON, Clifford L; LAFLEUR, Laci; SONTHEIMER, Richard D et al.Journal of the American Academy of Dermatology. 2008, Vol 59, Num 1, pp 143-145, issn 0190-9622, 3 p.Article

Effects of the photoacid generator type on the imaging and thermal decomposition properties of photo definable, thermally sacrificial poly(propylene carbonate) materialsWHITE, Celesta E; BALOGUN, Abimbola; HENDERSON, Clifford L et al.Journal of applied polymer science. 2006, Vol 102, Num 1, pp 266-271, issn 0021-8995, 6 p.Article